In order to get accurate photolithography, the wafer have to be aligned within nanometer or even sub nanometer scales. How is wafer alignment done so accurately?
Some online references say that it is a fiducial based system, just like in PCB alignment, but are the "vision cameras" literally SEMs, given that alignment needs to be so precise?
Some online references say that it is a fiducial based system, just like in PCB alignment, but are the "vision cameras" literally SEMs, given that alignment needs to be so precise?